Monte Carlo simulation of electron transmission through the scattering masks with angular limitation for projection electron lithography
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1505679
Reference18 articles.
1. New approach to projection‐electron lithography with demonstrated 0.1 μm linewidth
2. Proximity effect correction by the GHOST method using a scattering stencil mask
3. Electron scattering by electron-beam mask with tapered aperture in cell projection lithography
4. Electron Scattering and Related Phenomena in Scattering with Angular Limitation Projection Electron Lithography (SCALPEL*)
5. An Improved Electron Scattering Simulation at the Mask in a Projection Lithography System
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