Proximity effect correction by the GHOST method using a scattering stencil mask-Reference-Cited by-同舟云学术

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Proximity effect correction by the GHOST method using a scattering stencil mask

Published:1999 Issue:6 Volume:17 Page:2860
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Yamashita Hiroshi,Nomura Eiichi,Manako Shoko,Kobinata Hideo,Nakajima Ken,Nozue Hiroshi

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Monte Carlo Simulation of Projection Electron Beam Lithography;Solid State Phenomena;2007-03

2. Simulation of the proximity effect of electron beam lithography;Acta Physica Sinica;2006

3. Monte Carlo simulation of electron transmission through masks in projection electron lithography;Acta Physica Sinica;2006

4. Monte Carlo simulation of electron transmission through the scattering masks with angular limitation for projection electron lithography;Journal of Applied Physics;2002-10

5. Proximity effect correction using pattern shape modification and area density map for electron-beam projection lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2001

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