Uniform coating of Ta2O5 on vertically aligned substrate: A prelude to forced flow atomic layer deposition
Author:
Affiliation:
1. Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 300, Taiwan
2. Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 300, Taiwan
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4983805
Reference23 articles.
1. Step Coverage in ALD
2. Atomic Layer Deposition: An Overview
3. A brief review of atomic layer deposition: from fundamentals to applications
4. Rapid Coating of Through-Porous Substrates by Atomic Layer Deposition
5. Perpendicular-flow, single-wafer atomic layer deposition reactor chamber design for use with in situ diagnostics
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2. Enabling higher electrochemical activity of Pt nanoparticles uniformly coated on cubic titanium oxynitride by vertical forced-flow atomic layer deposition;Journal of Power Sources;2019-09
3. Forced flow atomic layer deposition of TiO2 on vertically aligned Si wafer and polysulfone fiber: Design and efficacy of conduit plates and soak function;Review of Scientific Instruments;2018-10
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