Perpendicular-flow, single-wafer atomic layer deposition reactor chamber design for use with in situ diagnostics
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4742991
Reference28 articles.
1. Atomic Layer Deposition of High-kOxides of the Group 4 Metals for Memory Applications
2. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
3. AVD and ALD as Two Complementary Technology Solutions for Next Generation Dielectric and Conductive Thin-Film Processing
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