Aspect-ratio-dependent charging in high-density plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.365616
Reference11 articles.
1. Microscopic uniformity in plasma etching
2. The Electron Charging Effects of Plasma on Notch Profile Defects
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5. New Phenomena of Charge Damage in Plasma Etching: Heavy Damage Only through Dense-Line Antenna
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