Author:
Yamamoto Hiroki,Seki Toshio,Matsuo Jiro,Koike Kunihiko,Kozawa Takahiro
Funder
Network Joint Research Center for Materials and Devices
Grant-in-Aid for Scientific Research
Ministry of Education, Culture, Sports, Science and Technology of Japan
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference18 articles.
1. International Technology Roadmap for Semiconductors, http://www.itrs.net (accessed online 2013).
2. Developments of Plasma Etching Technology for Fabricating Semiconductor Devices
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献