Modeling of Charging on Unconventional Surface Morphologies of PMMA Substrates During Ar Plasma Etching-Reference-Cited by-同舟云学术

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Modeling of Charging on Unconventional Surface Morphologies of PMMA Substrates During Ar Plasma Etching

Published:2015-11-09 Issue:5 Volume:13 Page:565-578
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Memos George¹,Kokkoris George¹

Affiliation:

1. Institute of Nanoscience and Nanotechnology; NCSR Demokritos; Athens 15310 Greece

Funder

Ministry of Education, Lifelong Learning, and Religious Affairs

European Social Fund

European Union and National Resources

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201500176/fullpdf

Reference58 articles.

1. An atomic force microscopy-based method for line edge roughness measurement

2. Review of profile and roughening simulation in microelectronics plasma etching

3. Nanotextured super-hydrophobic transparent poly(methyl methacrylate) surfaces using high-density plasma processing

4. Plasma Micro-Nanotextured, Scratch, Water and Hexadecane Resistant, Superhydrophobic, and Superamphiphobic Polymeric Surfaces with Perfluorinated Monolayers

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1. Specialized design for three basic mask patterns counteract charging effects during plasma etching;Physics of Plasmas;2024-02-01

2. EFFECTS OF EDGE ROUGHNESS ON SURFACE CHARGING IN PLASMA ETCHING;Surface Review and Letters;2023-08-26

3. The modification of roughness to corner effect in plasma etching;Physica Scripta;2023-07-18

4. Charging Issues on the Rectangle Mask Line During Plasma Etching with Consideration of Electron-Solid Interaction;Brazilian Journal of Physics;2023-07-11

5. Unconventional Surface Charging Within Deep Cavities on Airless Planetary Bodies: Particle‐In‐Cell Plasma Simulations;Journal of Geophysical Research: Planets;2023-02

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