Plasma parameters analysis of various mixed gas inductively coupled plasmas
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1475311
Reference17 articles.
1. Free Radicals in an Inductively Coupled Etching Plasma
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3. Time‐modulated electron cyclotron resonance plasma discharge for controlling generation of reactive species
4. Effects of rare gas dilution for control of dissociation, ionization, and radical density in fluorocarbon ultrahigh-frequency plasmas
5. Enhancement of the molecular nitrogen dissociation levels by argon dilution in surface-wave-sustained plasmas
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