Enhancement of the molecular nitrogen dissociation levels by argon dilution in surface-wave-sustained plasmas
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1359775
Reference14 articles.
1. Ultrahigh vacuum arcjet nitrogen source for selected energy epitaxy of group III nitrides by molecular beam epitaxy
2. Precise control of atomic nitrogen production in an electron cyclotron resonance plasma using N2/noble gas mixtures
3. Progress in the analysis of the mechanisms of ion nitriding
4. Polymer surface modification by plasmas and photons
5. Mass spectrometric measurement of molecular dissociation in inductively coupled plasmas
Cited by 23 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Nitrogen atoms absolute density measurement using two-photon absorption laser induced fluorescence in reactive magnetron discharge for gallium nitride deposition;Applied Physics Letters;2024-03-04
2. Effect of nitrocarburizing and argon admixing to SS 304 material for radioactive liquid waste storage facility in radiometallurgical installation;THE 4TH INTERNATIONAL CONFERENCE ON NUCLEAR ENERGY TECHNOLOGIES AND SCIENCES (ICoNETS) 2021;2022
3. Cross-comparison of diagnostic and 0D modeling of a micro-hollow cathode discharge in the stationary regime in an Ar/N2 gas mixture;Journal of Physics D: Applied Physics;2021-12-06
4. Effect of nitrocarburizing and argon admixing on low carbon steel for component facility in radiometallurgical installation;J MET MATER MINER;2021
5. Characterization of RF He-N2/Ar mixture plasma via Langmuir probe and optical emission spectroscopy techniques;Physics of Plasmas;2016-08
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3