Laser‐induced fluorescence of oxygen atoms in a plasma reactor
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.107486
Reference25 articles.
1. Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas
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3. Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas
4. Two‐photon laser‐induced fluorescence monitoring of O atoms in a plasma etching environment
5. EPR investigation of plasma-chemical resist etching in O2 and O2/CF4 discharges
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