Two‐photon laser‐induced fluorescence monitoring of O atoms in a plasma etching environment
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.334242
Reference23 articles.
1. Optical techniques in plasma diagnostics
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5. Mechanisms of etching and polymerization in radiofrequency discharges of CF4–H2, CF4–C2F4, C2F6–H2, C3F8–H2
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