Investigation of ion‐beam‐sputtered Nb‐Ti thin films by complementary use of backscattering and nuclear‐reaction microanalysis
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.324555
Reference30 articles.
1. Effect of Substrate Bias on Tantalum Films Sputtered in an Oxygen‐Argon Mixture
2. Structure and Composition of Sputtered Tantalum Thin Films on Silicon Studied by Nuclear and X‐Ray Analysis
3. Gas Incorporation into Sputtered Films
4. Investigation of the Composition of Sputtered Silicone Nitride Films by Nuclear Microanalysis
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1. Magnetic Materials Thin Films and Particles;Kirk-Othmer Encyclopedia of Chemical Technology;2000-12-04
2. MULTI-ION-BEAM REACTIVE CO-SPUTTERING (MIBRECS) TECHNIQUE AND ITS APPLICATIONS IN DEPOSITION OF MULTI-COMPONENT FERROELECTRIC (Pb, La) TIO3 THIN FILMS;Frontiers of Materials Research: Electronic and Optical Materials;1991
3. Multi-ion-beam reactive co-sputtering (MIBRECS) system and technique for preparing complex oxide thin films;Ferroelectrics;1990-08
4. Particle Bombardment Effects in Thin Film Deposition;Plasma-Surface Interactions and Processing of Materials;1990
5. Angular‐resolved ion‐beam sputtering apparatus for large‐area deposition;Review of Scientific Instruments;1989-08
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