Angular‐resolved ion‐beam sputtering apparatus for large‐area deposition
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1140690
Reference49 articles.
1. Geometrical factors of argon incorporation in SiO2 films deposited by ion beam sputtering
2. Angular distributions of heavy particles emitted from a Si target during an ion beam sputter process
3. The thermalization of energetic atoms during the sputtering process
4. Applications of Monte Carlo simulation in the analysis of a sputter‐deposition process
5. Monte Carlo calculation for structural modifications in ion‐assisted thin film deposition due to thermal spikes
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