Effect of Substrate Bias on Tantalum Films Sputtered in an Oxygen‐Argon Mixture
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1659724
Reference21 articles.
1. Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum Films
2. The mechanism of reactive sputtering
3. Investigation of Sputtered β-Tantalum Thin Films
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