Investigation of the Composition of Sputtered Silicone Nitride Films by Nuclear Microanalysis
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1653811
Reference10 articles.
1. Thermal Oxidation of Sputtered Tantalum Thin Films between 100° and 525°C
2. Properties of Amorphous Silicon Nitride Films
3. Silicon Nitride Films by Reactive Sputtering
4. La microanalyse de l'azote par l'observation directe de réactions nucléaires applications
5. Microanalysis of the stable isotopes of oxygen by means of nuclear reactions
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1. Theoretical analysis of defect formation processes in silicon nitride;Refractories and Industrial Ceramics;1998-05
2. Sputtertechniken;WFT Werkstoff-Forschung und -Technik;1987
3. Investigation of ion‐beam‐sputtered Nb‐Ti thin films by complementary use of backscattering and nuclear‐reaction microanalysis;Journal of Applied Physics;1978-12
4. Bibliography on Applications of Backscattering Spectrometry;Backscattering Spectrometry;1978
5. Microanalysis by Direct Observation of Nuclear Reactions;Material Characterization Using Ion Beams;1978
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