On the amorphization process in Al0.6Ga0.4As/GaAs heterostructures

Author:

Turkot B. A.,Robertson I. M.,Rehn L. E.,Baldo P. M.,Forbes D. V.,Coleman J. J.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. MD simulation of ion implantation damage in AlGaAs: III. Defect accumulation and amorphization;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2010-01

2. MD simulation of ion implantation damage in AlGaAs: II. Generation of point defects;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2010-01

3. Damage behaviour of GaAs/AlAs multilayer structures;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-08

4. Direct observation of electron-beam-induced nucleation and growth in amorphous GaAs;Materials Science in Semiconductor Processing;2004-02

5. Strain and compositional profile determination in ion bombarded heterostructures by the complementary use of RBS/channeling and high resolution X-ray diffraction;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2002-05

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