Determination of the nature of molecular bonding in silica from time-dependent dielectric breakdown data
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1728288
Reference16 articles.
1. Underlying physics of the thermochemical E model in describing low-field time-dependent dielectric breakdown in SiO2 thin films
2. Time dependent breakdown of ultrathin gate oxide
3. Low electric field breakdown of thin SiO/sub 2/ films under static and dynamic stress
4. Complementary model for intrinsic time-dependent dielectric breakdown in SiO2 dielectrics
5. Thermochemical description of dielectric breakdown in high dielectric constant materials
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