Low electric field breakdown of thin SiO/sub 2/ films under static and dynamic stress-Reference-Cited by-同舟云学术

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Low electric field breakdown of thin SiO/sub 2/ films under static and dynamic stress

Published:1997-05 Issue:5 Volume:44 Page:801-808
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Suehle J.S.,Chaparala P.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx1/16/12340/00568042.pdf?arnumber=568042

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