Cl2and HCl radical beam etching of GaAs and InP
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.103111
Reference11 articles.
1. Investigation of reactive ion etching induced damage in GaAs–AlGaAs quantum well structures
2. Passivation of donors in electron beam lithographically defined nanostructures after methane/hydrogen reactive ion etching
3. Defect study in GaAs bombarded by low-energy focused ion beams
4. GaAs Radical Etching with a Cl2Plasma in a Reactive Ion Beam Etching System
Cited by 55 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Uniform lateral etching of tungsten in deep trenches utilizing reaction-limited NF3plasma process;Japanese Journal of Applied Physics;2017-05-22
2. Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing;Journal of Physics D: Applied Physics;2017-04-13
3. Global Model of $\hbox{Cl}_{2}\hbox{/Ar}$ High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP;IEEE Transactions on Plasma Science;2012-04
4. Plasma etching of GaN and related materials;Handbook of Thin Films;2002
5. Plasma Processing of III-V Materials;Handbook of Advanced Plasma Processing Techniques;2000
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3