Control of dipole properties in high-k and SiO2 stacks on Si substrates with tricolor superstructure-Reference-Cited by-同舟云学术

Control of dipole properties in high-k and SiO2 stacks on Si substrates with tricolor superstructure

Published:2018-07-02 Issue:1 Volume:113 Page:012103
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Hotta Yasushi¹,Kawayama Iwao²,Miyake Shozo¹,Saiki Ikuya¹,Nishi Shintaro¹,Yamahara Kota¹,Arafune Koji¹,Yoshida Haruhiko¹,Satoh Shin-ichi¹,Sawamoto Naomi³,Ogura Atsushi³,Ito Akira⁴,Nakanishi Hidetoshi⁴,Tonouchi Masayoshi²^ORCID,Tabata Hitoshi⁵^ORCID

Affiliation:

1. Department of Electrical Engineering and Computer Science, University of Hyogo, Himeji, Hyogo 671-2280, Japan

2. Institute of Laser Engineering, Osaka University, Suita, Osaka 565-0871, Japan

3. School of Science and Technology, Meiji University, Kawasaki, Kanagawa 214-8571, Japan

4. SCREEN Holdings Co. Ltd., Kyoto, Kyoto 612-8486, Japan

5. Department of Electric Engineering, University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan

Funder

New Energy and Industrial Technology Development Organization

Japan Society for the Promotion of Science

Publisher

AIP Publishing

Subject