Chemical structure study of SiO2/4H-SiC (0001) interface transition region by angle-dependent x-ray photoelectron spectroscopy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3628322
Reference24 articles.
1. A cause for highly improved channel mobility of 4H-SiC metal–oxide–semiconductor field-effect transistors on the (112̄0) face
2. Advances in SiC power MOSFET technology
3. Interface Passivation for Silicon Dioxide Layers on Silicon Carbide
4. Effect of nitric oxide annealing on the interface trap densities near the band edges in the 4H polytype of silicon carbide
5. Effect of the oxidation process on SiO2/4H-SiC interface electrical characteristics
Cited by 28 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Transforming the Petroleum Industry through Catalytic Oxidation Reactions vis-à-vis Preceramic Polymer Catalyst Supports;ACS Omega;2023-09-12
2. Depth profiling of LE-µSR parameters with musrfit;Journal of Physics: Conference Series;2023-03-01
3. Gate-oxide interface performance improvement technology of 4H-SiC MOSFET;Chinese Science Bulletin;2023-02-07
4. Ozone oxidation of 4H-SiC and flat-band voltage stability of SiC MOS capacitors;Chinese Physics B;2022-11-01
5. SiC/SiO2 interface properties formed by low-temperature ozone re-oxidation annealing;Ceramics International;2021-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3