Electrical conduction properties of n-type Si-doped AlN with high electron mobility (>100cm2V−1s−1)

Author:

Taniyasu Yoshitaka,Kasu Makoto,Makimoto Toshiki

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 115 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Temperature dependence of electrical characteristics of Si-implanted AlN layers on sapphire substrates;Applied Physics Express;2023-06-01

2. Effect of High-temperature Annealing on AlN Crystal Grown by PVT Method;Journal of Inorganic Materials;2023

3. Growth of bulk AlN crystals;Reference Module in Materials Science and Materials Engineering;2023

4. Computational Identification of Ternary Wide-Band-Gap Oxides for High-Power Electronics;PRX Energy;2022-12-20

5. Novel boron‐rich aluminum nitride advanced ceramic materials;International Journal of Applied Ceramic Technology;2022-08-18

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