Production of high-density capacitively coupled radio-frequency discharge plasma by high-secondary-electron-emission oxide
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1827353
Reference13 articles.
1. Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing
2. Capacitively coupled glow discharges at frequencies above 13.56 MHz
3. Observation of radio‐frequency discharges at various driving frequencies
4. Abnormally low electron energy and heating-mode transition in a low-pressure argon rf discharge at 13.56 MHz
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