Investigation of the growth kinetics of glow‐discharge hydrogenated amorphous silicon using a radical separation technique
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.337144
Reference19 articles.
1. Fundamental mechanisms in silane plasma decompositions and amorphous silicon deposition
2. Origin of emitting species in the plasma deposition of a‐Si:H alloys
3. Reaction mechanisms of the radio frequency glow discharged deposition process in silane-helium
4. Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous silicon
5. A study of the silane glow discharge deposition by isotopic labelling
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