Fundamental mechanisms in silane plasma decompositions and amorphous silicon deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference65 articles.
1. Kinetics of Decomposition of Silane (Diluted in Argon) in a Low Pressure Glow Discharge
2. Heterogeneous Reactions in Non-Isothermal Low Pressure Plasmas: Preparative Aspects and Applications
3. Formation de dépôts de nitrure de silicium en couche mince obtenus par réaction chimique dans une décharge R.F. Basse pression
4. A kinetic model for radio frequency plasma-activated chemical vapour deposition
5. Reactive plasma deposited SixCyHz films
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