Microstructure evolution study of Pd–Ge ohmic contact formation on GaAs
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.370837
Reference15 articles.
1. Nonalloyed ohmic contacts ton‐GaAs by solid‐phase epitaxy of Ge
2. Comparison of PdGeTiPt and NiGeAu ohmic contacts to n-GaAs and PdGeTiPt and TiPd contacts to p+-GaAs
3. Ni, Pd, and Pt on GaAs: A comparative study of interfacial structures, compositions, and reacted film morphologies
4. Growth kinetics of Pd2Ge and PdGe on single-crystal and evaporated germanium
5. Ohmic Contact Formation Mechanism in the Ge/Pd/N-GaAs System
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1. In Situ Study of the Interface-Mediated Solid-State Reactions during Growth and Postgrowth Annealing of Pd/a-Ge Bilayers;ACS Applied Materials & Interfaces;2023-02-15
2. Influence of a Barrier Layer on the Formation of AuBe Ohmic Contact With the p-GaAs Bases of Heterojunction Bipolar Transistors;IEEE Transactions on Electron Devices;2011-08
3. Novel Cu/Cr/Ge/Pd Ohmic Contacts on Highly Doped n-GaAs;Journal of Electronic Materials;2008-02-27
4. Microstructure analysis of ohmic contacts on MBE grown n-GaSb and investigation of sub-micron contacts;Journal of Crystal Growth;2001-07
5. In-Situ Annealing Transmission Electron Microscopy Study of Pd/Ge/Pd/GaAs Interfacial Reactions;MRS Proceedings;1999
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