Increased O(D1) metastable density in highly Ar-diluted oxygen plasmas
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2180871
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3. Ultra‐low‐temperature growth of high‐integrity gate oxide films by low‐energy ion‐assisted oxidation
4. Growth of ultrathin SiO2 on Si by surface irradiation with an O2+Ar electron cyclotron resonance microwave plasma at low temperatures
5. Effects of ion irradiation on silicon oxidation in electron cyclotron resonance argon and oxygen mixed plasma
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