Effects of ion irradiation on silicon oxidation in electron cyclotron resonance argon and oxygen mixed plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.373868
Reference31 articles.
1. Selective anodic oxidation of silicon in oxygen plasma
2. Theory of the growth of SiO2 in an oxygen plasma
3. Review of oxidation processes in plasmas†
4. Study of oxygen transport processes during plasma anodization of Si between room temperature and 600 °C
5. Low Temperature Oxidation of Silicon in a Microwave‐Discharged Oxygen Plasma
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Diffusive racetrack oxidation in a Ti sputter target by reactive high power impulse magnetron sputtering;Journal of Physics D: Applied Physics;2012-08-30
2. Argon metastable state densities in inductively coupled plasma in mixtures of Ar and O2;Journal of Physics D: Applied Physics;2009-06-29
3. Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasma–surface simulations and experiments;Journal of Physics D: Applied Physics;2009-04-15
4. Effects of dielectric barrier discharges on silicon surfaces: Surface roughness, cleaning, and oxidation;Journal of Applied Physics;2009-04
5. Increased O(D1) metastable flux with Ar and Kr diluted oxygen plasmas and improved film properties of grown SiO2 film;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2008-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3