Significant enhancement of Si oxidation rate at low temperatures by atmospheric pressure Ar∕O2 plasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2721366
Reference18 articles.
1. Low‐rate plasma oxidation of Si in a dilute oxygen/helium plasma for low‐temperature gate quality Si/SiO2 interfaces
2. Growth Kinetics and Annealing Studies of the “Cathodic” Plasma Oxidation of Silicon
3. Oxidation of silicon
4. Atomic oxygen and the thermal oxidation of silicon
5. Kinetics of the silicon dioxide growth process in afterglows of microwave‐induced plasmas
Cited by 19 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. High-rate growth of gallium oxide films by plasma-enhanced thermal oxidation for solar-blind photodetectors;Applied Surface Science;2023-07
2. Chemical and Electrical Aspects of Homogeneous Discharge in an Argon-Oxygen Mixture for Ozone Generation;Plasma Medicine;2023
3. Interface Optimization and Transport Modulation of Sm2O3/InP Metal Oxide Semiconductor Capacitors with Atomic Layer Deposition-Derived Laminated Interlayer;Nanomaterials;2021-12-19
4. Spray‐Pyrolyzed High‐k Zirconium‐Aluminum‐Oxide Dielectric for High Performance Metal‐Oxide Thin‐Film Transistors for Low Power Displays;Advanced Materials Interfaces;2021-07-28
5. Numerical simulation on electric field intensity and reaction pathway in the He–O2 atmospheric pressure plasma jet;AIP Advances;2020-05-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3