Significant enhancement of Si oxidation rate at low temperatures by atmospheric pressure Ar∕O2 plasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2721366
Reference18 articles.
1. Low‐rate plasma oxidation of Si in a dilute oxygen/helium plasma for low‐temperature gate quality Si/SiO2 interfaces
2. Growth Kinetics and Annealing Studies of the “Cathodic” Plasma Oxidation of Silicon
3. Oxidation of silicon
4. Atomic oxygen and the thermal oxidation of silicon
5. Kinetics of the silicon dioxide growth process in afterglows of microwave‐induced plasmas
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