Spray‐Pyrolyzed High‐k Zirconium‐Aluminum‐Oxide Dielectric for High Performance Metal‐Oxide Thin‐Film Transistors for Low Power Displays
Author:
Affiliation:
1. Advanced Display Research Center (ADRC) Department of Information Display Kyung Hee University 26, Kyungheedae‐ro, Dongdaemun‐gu Seoul 02447 Korea
2. Department of Physics Jagannath University Dhaka 1100 Bangladesh
Funder
National Research Foundation of Korea
Publisher
Wiley
Subject
Mechanical Engineering,Mechanics of Materials
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.202100600
Reference73 articles.
1. Solution-Processed All-Oxide Transparent High-Performance Transistors Fabricated by Spray-Combustion Synthesis
2. High-k Gate Dielectrics for Emerging Flexible and Stretchable Electronics
3. High-Mobility ZnO Thin Film Transistors Based on Solution-processed Hafnium Oxide Gate Dielectrics
4. Self-Assembled Nanodielectrics for Solution-Processed Top-Gate Amorphous IGZO Thin-Film Transistors
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