Breakdown, steady‐state, and decay regimes in pulsed oxygen helicon diffusion plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.360335
Reference13 articles.
1. Fast anisotropic etching of silicon in an inductively coupled plasma reactor
2. The application of the helicon source to plasma processing
3. Multipole confined diffusion plasma produced by 13.56 MHz electrodeless source
4. Characterization of silicon dioxide films deposited at low pressure and temperature in a helicon diffusion reactor
5. Deposition of silicon dioxide films using the helicon diffusion reactor for integrated optics applications
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