Simulation study of the nanoparticles nucleation in a pulse-modulated capacitively coupled rf acetylene discharge
Author:
Affiliation:
1. Physics Department, Faculty of Science, Sahand University of Technology, 51335–1996 Tabriz, Iran
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5022367
Reference60 articles.
1. Pulse-time modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and less-charging polycrystalline silicon patterning
2. Pulse‐time‐modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and notch‐free polycrystalline silicon patterning
3. Time-resolved power and impedance measurements of pulsed radiofrequency discharges
4. Diagnostics and control of radicals in an inductively coupled etching reactor
5. A New Technology for Negative Ion Detection and the Rapid Electron Cooling in a Pulsed High-Density Etching Plasma
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