Pulse‐time‐modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and notch‐free polycrystalline silicon patterning
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.111290
Reference4 articles.
1. Extremely high‐selective electron cyclotron resonance plasma etching for phosphorus‐doped polycrystalline silicon
2. Low radio frequency biased electron cyclotron resonance plasma etching
3. Optimally Stable Electron Cyclotron Resonance Plasma Generation and Essential Points for Compact Plasma Source
4. Interaction of Amplitude Modulated Microwave with Highly Ionized Magneto-Plasma
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