Extremely high‐selective electron cyclotron resonance plasma etching for phosphorus‐doped polycrystalline silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.103649
Reference5 articles.
1. Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma
2. Chemical Vapor Deposition of a-Si:H Films Utilizing a Microwave Excited Ar Plasma Stream
3. Large Area Chemical Vapour Deposition of Diamond Particles and Films Using Magneto-Microwave Plasma
4. Influence of Deposition Conditions on the Properties of Silicon Nitride Films Prepared by the ECR Plasma CVD Method
5. Microwave Plasma Etching
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