Fluorine-based plasmas: Main features and application in micro-and nanotechnology and in surface treatment
Author:
Publisher
Elsevier BV
Subject
General Chemical Engineering,General Chemistry
Reference181 articles.
1. http://www.cpepweb.org/;
2. https://lasers.llnl.gov/science/understanding-the-universe/plasma-physics.
3. Total dissociation cross section of CF4and other fluoroalkanes for electron impact
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5. Contribution of bottom-emitted radicals to the deposition of a film on the SiO2 sidewall during CHF3 plasma etching
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