Development of high-density plasma reactor for high-performance processing and future prospects-Reference-Cited by-同舟云学术

Development of high-density plasma reactor for high-performance processing and future prospects

Published:2002-05 Issue:1-4 Volume:192 Page:216-243
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Samukawa Seiji

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference60 articles.

1. N. Fujiwara, T. Maruyama, M. Yoneda, K. Tsukamoto, in: Proceedings of the 15 Dry Process Sumposium, Institute of Electrical Engineering of Japan, Tokyo, 1993, p. 45.

2. The Electron Charging Effects of Plasma on Notch Profile Defects

3. H. Ohtake, S. Samukawa, in: Proceedings of the 17 Dry Process Symposium, Institute of Electrical Engineering of Japan, Tokyo, 1995, p. 45.

4. Time‐modulated electron cyclotron resonance plasma discharge for controlling generation of reactive species

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