Complex transients in power modulated inductively-coupled chlorine plasmas
Author:
Funder
Samsung Electronics
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://iopscience.iop.org/article/10.1088/1361-6595/ab000c/pdf
Reference30 articles.
1. Plasma etching: Yesterday, today, and tomorrow
2. Principles of Plasma Discharges and Materials Processing
3. Pulsed plasma etching for semiconductor manufacturing
4. Dynamics of pulsed-power chlorine plasmas
5. Highly Selective and Highly AnisotropicSiO2Etching in Pulse-Time Modulated Electron Cyclotron Resonance Plasma
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