Dynamics of pulsed-power chlorine plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.371447
Reference19 articles.
1. Pulse-time modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and less-charging polycrystalline silicon patterning
2. Time Variation of Plasma Properties in a Pulse-Time-Modulated Electron Cyclotron Resonance Discharge of Chlorine Gas
3. Effects of electron temperature in high‐density Cl2 plasma for precise etching processes
4. Negative ion measurements and etching in a pulsed-power inductively coupled plasma in chlorine
5. Charge Damage Caused by Electron Shading Effect
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3. E–H transitions in Ar/O2 and Ar/Cl2 inductively coupled plasmas: Antenna geometry and operating conditions;Journal of Applied Physics;2023-05-01
4. Mass spectroscopic measurement of time-varying ion composition in a pulse-modulated Ar/C4F8/O2 dual-frequency capacitively coupled plasma;Japanese Journal of Applied Physics;2023-03-10
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