Pulsed plasma etching for semiconductor manufacturing
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/47/i=30/a=303001/pdf
Reference134 articles.
1. Principles of Plasma Discharges and Materials Processing
2. Low Pressure Plasmas and Microstructuring Technology
3. Plasma Charging Damage
4. Surprising importance of photo-assisted etching of silicon in chlorine-containing plasmas
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