Silane pyrolysis rates for the modeling of chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.338180
Reference12 articles.
1. The deposition of silicon from silane in a low-pressure hot-wall system
2. Semi-Insulating Polysilicon (SIPOS) deposition in a low pressure CVD reactor
3. Characterization of low‐pressure chemical‐vapor‐deposited and thermally‐grown silicon nitride films
4. A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor
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