The deposition of silicon from silane in a low-pressure hot-wall system
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference8 articles.
1. Rate-determining reactions and surface species in CVD of silicon III. The SiH4-H2-N2 system
2. Low pressure deposition of polycrystalline silicon from silane
3. A.E.T. Kuiper, C.H.J. van den Brekel, J. de Groot and G.W. Veltkamp, to be published.
4. Structure and Stability of Low Pressure Chemically Vapor‐Deposited Silicon Films
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