A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor-Reference-Cited by-同舟云学术

A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor

Published:1984-02-01 Issue:2 Volume:131 Page:425-434
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Coltrin Michael E.¹²³,Kee Robert J.¹²³,Miller James A.¹²³

Affiliation:

1. Sandia National Laboratories, Laser and Atomic Physics Division, Albuquerque, New Mexico 87185

2. Sandia National Laboratories, Applied Mathematics Division, Livermore, California 94550

3. Sandia National Laboratories, Combustion Chemistry Division, Livermore, California 94550

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2115598/pdf

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