Deposition of lanthanum zirconium oxide high-κ films by liquid injection atomic layer deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2784956
Reference14 articles.
1. Pushing the Limits
2. High-κ gate dielectrics: Current status and materials properties considerations
3. Rare-earth oxide thin films as gate oxides in MOSFET transistors
4. Atomic Layer Deposited High-κ Films and Their Role in Metal-Insulator-Metal Capacitors for Si RF/Analog Integrated Circuit Applications
5. Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors
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