Complex transients of input power and electron density in pulsed inductively coupled discharges-Reference-Cited by-同舟云学术

Complex transients of input power and electron density in pulsed inductively coupled discharges

Published:2019-09-07 Issue:9 Volume:126 Page:093302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Gao Fei¹,Lv Xiang-Yun¹^ORCID,Zhang Yu-Ru¹,Wang You-Nian¹^ORCID

Affiliation:

1. Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics, Dalian University of Technology, Dalian 116024, People’s Republic of China

Funder

National Magnetic Confinement Fusion Science Program, China

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5114661

Reference47 articles.

1. Plasma etching: Yesterday, today, and tomorrow

2. Pulsed plasma etching for semiconductor manufacturing

3. Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics

4. Complex transients in power modulated inductively-coupled chlorine plasmas

5. Spatially averaged (global) model of time modulated high density argon plasmas

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