Titanium dioxide thin-film growth on silicon (111) by chemical vapor deposition of titanium(IV) isopropoxide
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1501751
Reference37 articles.
1. Discovery of a useful thin-film dielectric using a composition-spread approach
2. Structural and electrical characterization of TiO2 grown from titanium tetrakis-isopropoxide (TTIP) and TTIP/H2O ambients
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4. Highly conformal ZrO2 deposition for dynamic random access memory application
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