Highly conformal ZrO2 deposition for dynamic random access memory application
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1389756
Reference23 articles.
1. Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications
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3. The Characteristics of Growth of Films of Zirconium and Hafnium Oxides (ZrO2, HfO2) by Thermal Decomposition of Zirconium and Hafnium β‐Diketonate Complexes in the Presence and Absence of Oxygen
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