Effect of substrate temperature on recrystallization of plasma chemical vapor deposition amorphous silicon films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.346740
Reference8 articles.
1. High performance low-temperature poly-Si n-channel TFTs for LCD
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4. Recrystallization of amorphized polycrystalline silicon films on SiO2: Temperature dependence of the crystallization parameters
5. Variable structural order in amorphous silicon
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