Recrystallization of amorphized polycrystalline silicon films on SiO2: Temperature dependence of the crystallization parameters
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.339591
Reference32 articles.
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5. Dependence of A-Si:H Tfts Performances on Deposition and Process Parameters
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