Modulating the extent of fast and slow boron-oxygen related degradation in Czochralski silicon by thermal annealing: Evidence of a single defect
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4975685
Reference59 articles.
1. Characterization of the Initial Rapid Decay on Light-Induced Carrier Lifetime and Cell Performance Degradation of Czochralski-Grown Silicon
2. Electronically activated boron-oxygen-related recombination centers in crystalline silicon
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