Interlayer composition of HfO2∕Si(001) films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1773365
Reference18 articles.
1. Structure and stability of ultrathin zirconium oxide layers on Si(001)
2. High temperature stability in lanthanum and zirconia-based gate dielectrics
3. Chemical vapor deposition of HfO2 films on Si(100)
4. Physicochemical properties of HfO2 in response to rapid thermal anneal
5. HfO2/SiO2 interface chemistry studied by synchrotron radiation x-ray photoelectron spectroscopy
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